Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAlN Thin Films by Synchrotron Radiation

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Abstract

Residual stresses in TiN and TiAlN films on steel substrate were investigated by ultra high X-rays of synchrotron radiation. The specimens prepared in this study were single-, double- and multi-layer TiN and TiAlN films deposited on high speed steel substrate by arc-ion plating. The minimum thickness available for the residual stress measurement was 0.8µm by in-lab equipment whereas below 0.1µm by synchrotron radiation. Extremely large compressive residual stresses were found in the films. Residual stresses in TiAlN films were more than twice larger than those in TiN films, resulting to reduce the average residual stress in the whole film system by making double- or multi-layer film construction comparing to that in the single TiAlN film.

Journal

  • JSME International Journal Series A

    JSME International Journal Series A 47(3), 312-317, 2004-07-01

    The Japan Society of Mechanical Engineers

References:  12

Codes

  • NII Article ID (NAID)
    110004820491
  • NII NACSIS-CAT ID (NCID)
    AA11179396
  • Text Lang
    ENG
  • Article Type
    ART
  • ISSN
    13447912
  • NDL Article ID
    7006180
  • NDL Source Classification
    ZN11(科学技術--機械工学・工業)
  • NDL Call No.
    Z53-E315
  • Data Source
    CJP  NDL  NII-ELS  J-STAGE 
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