Nano-order Rapid Patterning of Quartz Surface Using Focused Ion Beam(M^4 processes and micro-manufacturing for science)

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  • TANIGUCHI Jun
    Department of Applied Electronics, Tokyo University of Science
  • NAKAO Takaaki
    Department of Applied Electronics, Tokyo University of Science
  • KOGO Yasuo
    Department of Materials Science and Technology, Tokyo University of Science
  • MIYAMOTO Iwao
    Department of Applied Electronics, Tokyo University of Science
  • KAWASEGI Noritaka
    Graduate School of Science and Engineering, Toyama University
  • MORITA Noboru
    Department of Mechanical and Intellectual Systems Engineering, Toyama University
  • MOMOTA Sadao
    Department of Intelligent Mechanical Systems Engineering, Kochi University of Technology

抄録

To achieve rapid patterning of quartz surface, ion beam irradiation using focused ion beam (FIB) and succeeding buffered hydrofluoric acid wet etching of quartz was examined. The etched depths of quartz saturated with increasing of ion dose and the optimum wet etching time was 60s. This process improved surface roughness and fabricated a 34nm depth and 487nm width line pattern using 330nm diameter FIB irradiation.

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