Z-Pinch Discharge Plasma Based EUV Sources

• KATSUKI Sunao

  Kumamoto University

• SAKUGAWA Takashi

  Kumamoto University

• NAMIHIRA Takao

  Kumamoto University

• AKIYAMA Hidenori

  Kumamoto University

Bibliographic Information

Other Title

• Z ピンチ放電プラズマ EUV 光源
• Zピンチ ホウデン プラズマ EUV コウゲン

Abstract

Presently high energy-density plasmas produced by gas discharges (DPP) are the most powerful EUV source for the next generation’s high volume semiconductor manufacturing(HVM). This paper describes the radiation process in Z-pinch plasmas based on non-equilibrium ionization process and the fundamental Z-pinch plasma physics. Several schemes to control the pinching process and plasma parameters are shown. Also the present status of EUV sources developments and the critical issues to develop the DPP based EUV sources are discussed.

Journal

• Journal of Plasma and Fusion Research

  Journal of Plasma and Fusion Research 81 (4), 231-239, 2005

  The Japan Society of Plasma Science and Nuclear Fusion Research

Keywords

• EUV
• lithography
• conversion efficiency
• Z-pinch
• discharge produced plasma
• non-equilibrium ionization process
• pre-ionization
• axial magnetic field
• debris

Details

• CRID: 1390001206512010624
• NII Article ID: 110006281921
• NII Book ID: AN10401672
• DOI: 10.1585/jspf.81.231
• COI: 1:CAS:528:DC%2BD2MXlt1eqsbw%3D
• NDL BIB ID: 7346286
• ISSN: 09187928
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7346286
• Web Site: https://www.jstage.jst.go.jp/article/jspf/81/4/81_4_231/_pdf
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/10455867
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • NDL-Digital
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed