Hydrogen-Induced Degradation Mechanisms in Ferroelectric PbZr<sub>0.4</sub>Ti<sub>0.6</sub>O<sub>3</sub>and Bi<sub>3.25</sub>La<sub>0.75</sub>Ti<sub>3</sub>O<sub>12</sub>Thin Films
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- Yoon Jong-Gul
- Research Center for Oxide Electronics and School of Physics, Seoul National University, Seoul 151-742, Korea Department of Physics, University of Suwon, Kyunggi-do 445-743, Korea
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- Seo Sunae
- Research Center for Oxide Electronics and School of Physics, Seoul National University, Seoul 151-742, Korea
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- Kang Bo Soo
- Research Center for Oxide Electronics and School of Physics, Seoul National University, Seoul 151-742, Korea
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- Kim Jung Dae
- Research Center for Oxide Electronics and School of Physics, Seoul National University, Seoul 151-742, Korea
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- Noh Tae W.
- Research Center for Oxide Electronics and School of Physics, Seoul National University, Seoul 151-742, Korea
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- Lee Yong Kyun
- Microelectronics Lab, SAIT, Suwon 440-600, Korea
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- Park Young Soo
- Microelectronics Lab, SAIT, Suwon 440-600, Korea
書誌事項
- タイトル別名
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- Hydrogen-Induced Degradation Mechanisms in Ferroelectric PbZr0.4Ti0.6O3 and Bi3.25La0.75Ti3O12 Thin Films.
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Hydrogen-induced degradation in PbZr0.4Ti0.6O3 and Bi3.25La0.75Ti3O12 (BLT) capacitors was investigated after forming gas annealing (FGA). By comparison, the BLT capacitors were found to have a high resistance against hydrogen-induced degradation at the low temperature FGA below 350°C. The BLT capacitors showed only a small reduction of remanent polarization and no deformation of hysteresis loops while the PZT showed a large polarization degradation after the same FGA process. The degradation of PZT at the low temperature FGA was investigated systematically by measuring the voltage shifts of hysteresis loop, and current-voltage and capacitance-voltage characteristics. Different degradation mechanisms are suggested for PZT and BLT by comparing experimental results including those of thermogravimetric analysis. For PZT films, pinning of domains and defect dipoles due to charged defects is inferred to dominate the initial stage of the degradation. On the other hand, for BLT films, hydrogen-induced decomposition seems to govern the degradation resulting in the increase of leakage current density and production of non-ferroelectric oxide(s).
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 41 (11B), 6781-6784, 2002
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681232563712
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- NII論文ID
- 110006342031
- 130004529094
- 210000052251
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- NII書誌ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 6371131
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可