Glow Plasma Behaviour in Nitriding Process(Physics, Process, Instruments & Measurements)

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Author(s)

Abstract

Spectroscopic and some other diagnoses were carried out for investigation of DC glow plasma behaviour in ion nitriding process. Anitrogen-10% hydrogen mixture gas was used. The specimen was an austenitic stainless steel (SUS304), settled as the cathode. Current, voltage and gas pressure were mainly changed as plasma parameters. The spectral intensities are influenced by these parameters. N_2 and N_2^+ exited state were strongly detected. The intensity ratio N_2^+/N_2 depends on the gas pressure which was changed from 267 to 933Pa. This dependence can be explained in terms of mean free path of particles. It was found that the ion nitridingprocess is largely controlled by ion density and cathode fall voltage. Also, the nitriding rate is the fastest at gas pressures from 533Pa (4 torr) to 666Pa (5 torr) which can be explained by taking into account the glow discharge behaviours.

Journal

  • Transactions of JWRI

    Transactions of JWRI 22(1), 13-19, 1993-08

    Osaka University

Codes

  • NII Article ID (NAID)
    110006487007
  • NII NACSIS-CAT ID (NCID)
    AA00867058
  • Text Lang
    ENG
  • ISSN
    03874508
  • Data Source
    NII-ELS 
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