Manufacturability-Aware Design of Standard Cells

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Author(s)

    • MUTA Hirokazu
    • Department of Communications and Computer Engineering, Kyoto University

Abstract

We focus our attention on the layout dependent Across Chip Linewidth Variability (ACLV) of gate-forming poly-silicon patterns as a measure for manufacturability, which is a major contributor of systematic gate-length variation. First, we study the ACLV of standard cell layouts by lithography simulation. Then, we introduce regularity in gate-forming poly-silicon patterns and how it improves the ACLV and also how it incurs area-overhead. According to the investigation, we propose two design guidelines for standard-cell layout that can reduce ACLV with reasonable area overhead. Those guidelines include on-grid fixed-pitch layout with dummy-poly insertion and stretched gate-poly extension. Design experiments assuming a 65nm process technology indicate that a D-FF designed with the first guideline reduces ACLV by 35% with 14% area overhead and the second guideline reduces ACLV by 75% with 29% area overhead at the best focus condition. Under defocus conditions, both layouts exhibit stable characteristics whereas the variability of conventional layout grows rapidly as the level of defocus increases. Circuit-level lithography simulation over benchmark circuits also supports that the proposed guidelines considerably reduces the amount of gate length variation.

Journal

  • IEICE Trans. on Electronics

    IEICE Trans. on Electronics 90(12), 2682-2690, 2007-12-01

    The Institute of Electronics, Information and Communication Engineers

References:  12

Cited by:  8

Codes

  • NII Article ID (NAID)
    110007538012
  • NII NACSIS-CAT ID (NCID)
    AA10826239
  • Text Lang
    ENG
  • Article Type
    Journal Article
  • ISSN
    09168508
  • Data Source
    CJP  CJPref  NII-ELS 
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