Influence of Ohmic Contact Resistance on Transconductance in AlGaN/GaN HEMT
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- HIROSE Yoshikazu
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- HONSHIO Akira
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- KAWASHIMA Takeshi
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- IWAYA Motoaki
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- KAMIYAMA Satoshi
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- TSUDA Michinobu
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- AMANO Hiroshi
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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- AKASAKI Isamu
- Department of Materials Science and Engineering, and Nano-factory, Meijo University
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Abstract
The correlation between ohmic contact resistivity (ρ_c) and transconductance (g_m) in AlGaN/GaN high-electron-mobility transistors (HEMTs) was investigated. To characterize ρ-c precisely, we fabricated a circular transmission line model (c-TLM) pattern adjoined to a field-effect transistor (FET) pattern on an HEMT. By measuring ohmic contact resistance and sheet resistance using the adjoined c-TLM, intrinsic transcon-ductance (g_<m0>), which is not influenced by the source resistance, can be estimated. The g_<m0> thus obtained is between 179 and 206mS/mm. Then, it became possible to calculate the correlation between g_m and ρ_c. We found that ρ_c should be below 10^<-5>Ωcm^2 for the improvement of g_m in AlGaN/GaN HEMT when R_<sh>≒400Ω/□.
Journal
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- IEICE transactions on electronics
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IEICE transactions on electronics 89 (7), 1064-1067, 2006-07-01
The Institute of Electronics, Information and Communication Engineers
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Details 詳細情報について
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- CRID
- 1573105977405282048
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- NII Article ID
- 110007538789
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- NII Book ID
- AA10826283
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- ISSN
- 09168524
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- Text Lang
- en
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- Data Source
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- CiNii Articles