走査型半導体露光装置における移動順最適化(機械力学,計測,自動制御)  [in Japanese] Optimizing Movement Sequences for Step-and-Scan Lithography Equipments(Mechanical Systems)  [in Japanese]

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Abstract

The purpose of this paper is to optimize the throughput of step-and-scan lithography equipments. For this purpose, we propose a method for MSOP (Movement Sequence Optimization Problem) which is a problem of visiting all shots on a wafer in the minimum time. It is well-known that, as a traveling salesman problem, MSOP on stepper lithography equipments can be formulated. In step-and-scan lithography equipments, the scanning directions of all shots must be determined in addition with the sequence of shots. For this reason, the traveling salesman problem formulation could not be applied to MSOP on step-and-scan lithography equipments. We overcame this problem on step-and-scan lithography equipments by introducing dummy vertices to express scanning directions in the traveling salesman problem formulation. By this method, the exactly optimized sequence with scanning direction of shots became available for MSOPs given. As a result of numerical experiment, our proposed method could exactly solve difficult MSOP with over 232 shots on a wafer. In addition with this, our results showed 0.25%〜4.66% improvement on the productivity of step-and-scan lithography equipment.

Journal

  • TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C

    TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C 76(770), 2578-2583, 2010

    The Japan Society of Mechanical Engineers

References:  5

Codes

  • NII Article ID (NAID)
    110007817375
  • NII NACSIS-CAT ID (NCID)
    AN00187463
  • Text Lang
    JPN
  • Article Type
    ART
  • ISSN
    0387-5024
  • NDL Article ID
    10884132
  • NDL Source Classification
    ZN11(科学技術--機械工学・工業)
  • NDL Call No.
    Z16-1056
  • Data Source
    CJP  NDL  NII-ELS  J-STAGE 
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