Numerical Simulation Code for Microwave Excited Surface Wave Plasma Semi-conductor Process

• HATAGUCHI, Masato

• NISHIKAWA, Takayuki

• KAWAGUCHI, Hideki

• KAGAMI, Shin

Bibliographic Information

Other Title

• マイクロ波励起表面波プラズマ半導体処理装置の数値解析コードにおけるプラズマ電子密度分布の計算も含めた解析スキームの検討
• マイクロハレイキヒョウメンハ プラズマ ハンドウタイ ショリ ソウチ ノ スウチ カイセキ コード ニ オケル プラズマ デンシ ミツド ブンプ ノ ケイサン モ フクメタ カイセキ スキーム ノ ケントウ

Abstract

The microwave excited surface wave plasma process enables us to do less damage processing by active neutral gaseous and wide area processing. On the other hand, the surface wave plasma is strong coupling phenomena of microwave and plasma, and detail understanding of the phenomena by any pure analytical methods is not easy. Authors have been working in development of numerical simulation tool for this equipment by using FDTD method. So far the FDTD method with appropriate plasma macro model which is partially based on experimental data of electron density was proposed and good agreements with experimental results was obtained. As the next stage of the development of the numerical code, this paper presents estimation of electron density distribution in simulation.

Journal

• 日本AEM学会誌

  日本AEM学会誌 19 (2), 348-353, 2011-06-10

  日本AEM学会

Keywords

• Plasma semi-conductor process
• Surface wave plasma
• FDTD simulation
• Self-consistent analysis

Details

• CRID: 1050001201688518400
• NII Article ID: 110008673752
• NII Article ID: 120004922114
• NII Book ID: AN10457520
• HANDLE: 10258/1715
• NDL BIB ID: 11172715
• ISSN: 09194452
• Web Site: https://muroran-it.repo.nii.ac.jp/records/7118
• Web Site: http://id.ndl.go.jp/bib/11172715
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I11172715
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/11149538
• Text Lang: ja
• Article Type: journal article
• Data Source:
  • IRDB
  • NDL
  • NDL-Digital
  • CiNii Articles
  • KAKEN