書誌事項
- タイトル別名
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- J0402-1-6 Development of Wavelength-Tunable Picosecond Ultrasound Method for Evaluating Ultrasonic Attenuation Oxide Thin Films
抄録
Thin-film mechanical resonators are promising for high frequency bandpass filters. Amorphous oxide thin films are expected to be important candidates because they are free from grain scattering loss. However, it has been difficult to characterize their acoustic properties, especially attenuation, which is a key parameter for designing a high-Q resonator. Here, we present a novel methodology for evaluating ultrasonic attenuation of amorphous oxide thin films deposited on silicon substrate at very high frequencies between 200 and 300 GHz. This method uses the high sensitivity of the refractive index of light in silicon near to the wavelength near 400 nm. Detecting Brillouin oscillations from silicon substrate, which is caused by the transmitted acoustic wave, we can evaluate the frequency dependence of the attenuation coefficient in the thin film through an inverse calculation.
収録刊行物
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- 年次大会講演論文集
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年次大会講演論文集 2010.6 (0), 395-396, 2010
一般社団法人 日本機械学会
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詳細情報 詳細情報について
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- CRID
- 1390001206067490048
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- NII論文ID
- 110008700706
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- ISSN
- 24331325
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可