High growth rate of vertically aligned carbon nanotubes using a plasma shield in microwave plasma-enhanced chemical vapor deposition

• Kinoshita, Hiroshi

• Kume, Ippei

• Sakai, Hirokazu

• Tagawa, Masahito

• Ohmae, Nobuo

収録刊行物

• Carbon

  Carbon 42 (12-13), 2753-2756, 2004-01

  Elsevier

詳細情報

• CRID: 1050294045371866496
• NII論文ID: 120000944695
• HANDLE: 20.500.14094/90000291
• ISSN: 00086223
• 本文言語コード: en
• 資料種別: journal article
• データソース種別:
  • IRDB
  • CiNii Articles