Light-controlled selective metal deposition on photopolymer films

IR

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Abstract

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Fine metal patterning was performed by selective Mg deposition on photopolymers. Mg patterns with a minimum width of 5 mum were obtained by using maskless vacuum evaporation. The selective deposition originates in the difference of glass transition temperature, microscopically, of surface molecular motion between polymerized and nonpolymerized photopolymer surfaces. The difference between photoreactive small molecules and polymers was also discussed. The selective metal deposition method would be applied to a wide range of organic surfaces; this method showed great potential for the preparation of fine wiring for various organic electronic devices.

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