Light-controlled selective metal deposition on photopolymer films
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Abstract
type:Article
Fine metal patterning was performed by selective Mg deposition on photopolymers. Mg patterns with a minimum width of 5 mum were obtained by using maskless vacuum evaporation. The selective deposition originates in the difference of glass transition temperature, microscopically, of surface molecular motion between polymerized and nonpolymerized photopolymer surfaces. The difference between photoreactive small molecules and polymers was also discussed. The selective metal deposition method would be applied to a wide range of organic surfaces; this method showed great potential for the preparation of fine wiring for various organic electronic devices.
Journal
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- Applied physics letters
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Applied physics letters 94 013302-1-013302-3,
American Institute of Physics
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Details 詳細情報について
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- CRID
- 1050001337802982784
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- NII Article ID
- 120001088952
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- NII Book ID
- AA00543431
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- ISSN
- 00036951
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- Text Lang
- en
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- Article Type
- journal article
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- Data Source
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- IRDB
- CiNii Articles
- KAKEN