Sustainable Electrodeposition of ZnO by a Galvanic Contact Method

• Shinagawa, Tsutomu

• Murase, Kuniaki

• Izaki, Masanobu

抄録

The galvanic contact deposition of ZnO was carried out by immersing a conductive substrate short-circuited with a Zn rod into O2-saturated aqueous Zn(ClO4)2 solutions, and the deposition behaviors were investigated in comparison with that in Zn(NO3)2. The dissolution of the Zn rod in the Zn(ClO4)2 solutions supplied a continuous and almost constant current to the substrate, allowing the cathodic electrodeposition of ZnO without an external power and by-products. The morphology of the resulting ZnO depended on the Zn(ClO4)2 concentration. In contrast, a much smaller current was observed in the Zn(NO3)2 solution, and little ZnO was deposited.

収録刊行物

• ELECTROCHEMICAL AND SOLID STATE LETTERS

  ELECTROCHEMICAL AND SOLID STATE LETTERS 12 (9), D72-D75, 2009

  Electrochemical Society

キーワード

• dissolving
• electrochemical electrodes
• electrodeposition
• II-VI semiconductors
• semiconductor thin films
• wide band gap semiconductors
• zinc compounds

詳細情報

• CRID: 1050282677041017216
• NII論文ID: 120002098816
• NII書誌ID: AA1124254X
• ISSN: 10990062
• HANDLE: 2433/109929
• 本文言語コード: en
• 資料種別: journal article
• データソース種別:
  • IRDB
  • CiNii Articles