Enhancement of ultraviolet light responsivity of a pentacene phototransistor by introducing photoactive molecules into a gate dielectric

IR

Abstract

We demonstrated a new approach to fabricate an ultraviolet (UV) photodetector with a pentacene transistor structure where photoactive molecules of 6-[4'-(N,N-diphenylamino)phenyl]-3-ethoxycarbonylcoumarin (DPA-CM) were introduced into a poly(methyl methacrylate) (PMMA) gate dielectric. DPA-CM molecules strongly absorb UV light and form stable charge-separation states. When a negative gate voltage was scanned to a gate electrode of the transistor, the charge-separation states of DPA-CM molecules were converted into free electrons and holes. The free electrons traversed and subsequently reached an interface of the PMMA:DPA-CM layer and a polystyrene buffer layer, inducing accumulation of additional holes in a pentacene channel. Therefore, under 2.54 mW/cm^2 of 365 nm UV irradiation, a marked increase in drain current by 6.1 × 10^2 times were obtained from the transistor. Moreover, the phototransistor exhibited a high light responsivity of 0.12 A/W which is about one order of magnitude larger than that of a conventional pentacene phototransistor [Lucas et al., Thin Solid Films 517 (2009) 280]. This result will be useful for manufacturing of a high-performance UV photodetector.

identifier:https://dspace.jaist.ac.jp/dspace/handle/10119/12912

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Details 詳細情報について

  • CRID
    1050564288760316672
  • NII Article ID
    120005652016
  • ISSN
    00214922
  • Web Site
    http://hdl.handle.net/10119/12912
  • Text Lang
    en
  • Article Type
    journal article
  • Data Source
    • IRDB
    • CiNii Articles
    • KAKEN

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