Realization of direct bonding of single crystal diamond and Si substrates
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Diamond/Si junctions have been achieved by surface activated bonding method without any chemical and heating treatments. Bonded interfaces were obtained that were free from voids and mechanical cracks. Observations by using transmission electron microscopy indicated that an amorphous layer with a thickness of ~20nm across the bonded interface was formed, and no structural defects were observed at the interface....
収録刊行物
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- Applied Physics Letters
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Applied Physics Letters 110 (11), 111603-, 2017-03
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1050282677424438400
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- NII論文ID
- 120006453318
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- NII書誌ID
- AA11868096
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- ISSN
- 10773118
- 00036951
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- 本文言語コード
- en
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- 資料種別
- journal article
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- データソース種別
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