Yield-aware mask assignment by positive semidefinite relaxation in triple patterning using cut process

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Journal

  • Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3)

    Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) 15(No. 2), 1-7, 2016-03

Codes

  • NII Article ID (NAID)
    120006582497
  • Text Lang
    ENG
  • Article Type
    journal article
  • Data Source
    IR 
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