Photonic Crystal Nanocavities with an Average Q factor of 1.9 million Fabricated on a 300-mm-Wide SOI Wafer Using a CMOS-Compatible Process

• Ashida, Kohei

• Okano, Makoto

• Yasuda, Takamasa

• Ohtsuka, Minoru

• Seki, Miyoshi

• Yokoyama, Nobuyuki

• Koshino, Keiji

• Yamada, Koji

• Takahashi, Yasushi

Abstract

application/pdf

Article

Journal of Lightwave Technology. 2018, 36 (20), p.4774-4782

Journal

• Journal of Lightwave Technology

  Journal of Lightwave Technology 36 (20), 4774-4782, 2018-08-27

  IEEE, OSA Publishing

Keywords

• photonic crystal
• SOI wafer
• photolithography
• resonator
• fabrication process

Details

• CRID: 1050292726807635968
• NII Article ID: 120006719640
• ISSN: 07338724
• ISSN: 15582213
• DOI: 10.1109/jlt.2018.2861894
• HANDLE: 10466/16061
• Web Site: https://omu.repo.nii.ac.jp/records/386
• Web Site: http://xplorestaging.ieee.org/ielx7/50/8458343/08424812.pdf?arnumber=8424812
• Text Lang: en
• Article Type: journal article
• Data Source:
  • IRDB
  • Crossref
  • CiNii Articles
  • KAKEN