High hardness and low dielectric constant thin films with oriented urea oligomers by physical vapor deposition

• 森本, 勝大

• Fukutomi, Tatsuya

• 小柴, 康子

• 石田, 謙司

抄録

Oligomers of undecylurea (OUA11) thin films with a high crystallinity, surface hardness, perpendicular orientation, and low dielectric constant were fabricated by physical vapor deposition. The thin films were composed of single OUA11, which has a relatively high molecular weight (Mw: 2500, Mn: 1200) and could be vapor-deposited without thermal decomposition. These films had a much higher crystallinity and a high surface hardness level of 9H in the pencil hardness test. The dielectric constant of the OUA11 films is estimated to be 2.1–2.3 in the frequency range of 1 Hz–0.1 MHz, which is lower than that of typical low dielectric constant (low-k) materials. These physical and electrical properties are caused by the unique structure with the molecular dipoles-oriented parallel to the electrodes on the substrate and the strong intermolecular hydrogen bonds. The unique structure could not be observed with spin-coating and is specific to the vapor-deposited films. We expect that the OUA11 films with a high hardness and a low dielectric constant can be used not only as protective coatings but also as electronic materials.

収録刊行物

• Journal of Materials Science

  Journal of Materials Science 54 (3), 2483-2492, 2019-02

  Springer

キーワード

• Mechanical Engineering
• Mechanics of Materials
• General Materials Science

詳細情報

• CRID: 1050575520346249856
• NII論文ID: 120006764471
• NII書誌ID: AA00701725
• DOI: 10.1007/s10853-018-3000-2
• ISSN: 15734803
• ISSN: 00222461
• HANDLE: 20.500.14094/90006459
• Web Site: http://link.springer.com/article/10.1007/s10853-018-3000-2/fulltext.html
• Web Site: http://link.springer.com/content/pdf/10.1007/s10853-018-3000-2.pdf
• 本文言語コード: en
• 資料種別: journal article
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