Quartz crystal microbalance for real-time monitoring chlorosilane gas transport in slim vertical cold wall chemical vapor deposition reactor
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Chlorosilane gas transport in ambient hydrogen in a slim vertical cold wall chemical vapor deposition reactor was real-time monitored using a quartz crystal microbalance (QCM) using its behaviour responding to the properties of the gas mixture. The QCM frequency quickly decreased by introducing the trichlorosilane gas, while it slowly decreased by the dichlorosilane gas. The QCM frequency behavior was explained by the gas flow condition, such as the plug flow and recirculating flow, in the reactor. The relationship was consistent with the gas flow calculations, because the heavy and light gases could directly flow downward and recirculate, respectively, in the chamber due to natural convection. The information obtained from the QCM frequency behavior is expected to be utilized for the real-time gas monitoring and for the process design.
収録刊行物
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- Materials Science in Semiconductor Processing
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Materials Science in Semiconductor Processing 106 104759-, 2020-02
Elsevier
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詳細情報
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- CRID
- 1050002213032540160
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- NII論文ID
- 120006796058
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- NII書誌ID
- AA11350145
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- ISSN
- 13698001
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- Web Site
- http://hdl.handle.net/10131/00012906
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- 本文言語コード
- en
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- 資料種別
- journal article
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- データソース種別
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- IRDB
- CiNii Articles