Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography
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We synthesized the various hyperbranched polyacetals poly(t-BCRA[4]-co-BVOC), poly(t-BCRA[4]-co-BVOP), poly(t-BCRA[4]-co-BVOXP), poly(t-BCRA[4]-co-BVBC), and poly(t-BCRA[4]-co-TVCH) by polyaddition of C-(4-t-butylbenz)calix[4]resorcinarene (t-BCRA[4]) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC), 1,3-bis(vinyloxy)propane (BVOP), 1,5-bis(vinyloxy)-3-oxapentane (BVOXP), 4,4'-bis(vinyloxy)-1,1'-bicyclohexane (BVBC), and 1,3,5-tris(vinyloxy)cyclohexane (TVCH), respectively. The resist sensitivity of the synthesized polymers using EUV exposure tool was consistent with their structures, and is in the order poly(t-BCRA[4]-co-BVOC) > poly(t-BCRA[4]-co-BVOXP) > poly(t-BCRA[4]-co-TVCH) > poly(t-BCRA[4]-co-BVOP) >> poly(t-BCRA[4]-co-BVBC). Furthermore, poly(t-BCRA[4]-co-BVOC) showed good resist properties such as out-gassing property using EUV exposure tool, film-thickness loss property, and etching durability. Overall, our results indicate that hyperbranched polyacetal poly(t-BCRA[4]-co-BVOC) has high potential as next-generation resist material for EUV photolithography.
収録刊行物
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- Reactive and Functional Polymers
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Reactive and Functional Polymers 131 1-33, 2018-10
Elsevier
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詳細情報 詳細情報について
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- CRID
- 1050004225257402240
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- NII論文ID
- 120006881343
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- NII書誌ID
- AA11059893
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- ISSN
- 13815148
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- HANDLE
- 10112/00020487
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- 本文言語コード
- en
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- 資料種別
- journal article
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