Electroplated Fe films prepared from a deep eutectic solvent

• Yanai, Takeshi

• Shiraishi, K.

• Shimokawa, Takaya

• Watanabe, Y.

• Ohgai, Takeshi

• Nakano, Masaki

• Suzuki, K.

• Fukunaga, Hirotoshi

抄録

Electroplating of Fe films was carried out from choline chloride-ethylene glycol types of DES (Deep Eutectic Solvent). We investigated magnetic properties of the plated Fe films and evaluated the productivity for the electroplating process. Consequently, we found that surface morphology and current efficiency of the plated films were affected by the bath temperature. We obtained the Fe films with relatively smooth surface and high current efficiency in the bath temperature range from 70 to 110°C. The deposition rate for our process depended on the current density, and we obtained high deposition rate value of approximately 120μm/h. We also obtained high current efficiency values of approximately 90% in the wide range of plating time. These results indicate that the DES-based bath has industrial advantages for mass-producing Fe films. Therefore, we conclude that the DES-based bath is an attractive plating bath for Fe films.

Journal of Applied Physics, 115(17), 17A344; 2014

収録刊行物

• Journal of Applied Physics

  Journal of Applied Physics 115 (17), 17A344-, 2014-05-07

  American Institute of Physics Inc.

キーワード

• General Physics and Astronomy

詳細情報

• CRID: 1050568772228798080
• NII論文ID: 120006986517
• ISSN: 00218979
• ISSN: 10897550
• DOI: 10.1063/1.4870319
• HANDLE: 10069/34646
• Web Site: https://nagasaki-u.repo.nii.ac.jp/records/5565
• Web Site: https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/1.4870319/13414257/17a344_1_online.pdf
• 本文言語コード: en
• 資料種別: journal article
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