Suppression of conductivity deterioration of copper thin films by coating with atomic-layer materials
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<jats:p>Theoretical calculations are performed to explore the electronic structures and electron conducting properties of copper (Cu) thin films coated with graphene or h-boron-nitride (h-BN) layers. The Shockley surface states of Cu surfaces are preserved by the graphene and h-BN coatings which prevent the surface oxidation of Cu because of the weak interaction between the Cu surface and graphene or the h-BN layers. Furthermore, the Shockley surface states in Cu thin films possess quasi-two dimensional free-electron characteristics and exhibit a high conductivity of 1.62 × 107 (Ωm)−1 at room temperature. These hybrid structures may be suitable as interconnects in memory devices that can stably store data for long periods.</jats:p>
収録刊行物
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- Applied Physics Letters
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Applied Physics Letters 110 (13), 131601-, 2017-03
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1050001202554503552
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- NII論文ID
- 120007129208
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- NII書誌ID
- AA00543431
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- ISSN
- 10773118
- 00036951
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- HANDLE
- 2241/00146034
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- 本文言語コード
- en
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- 資料種別
- journal article
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- データソース種別
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