Elastic-constant measurement in oxide and semiconductor thin films by Brillouin oscillations excited by picosecond ultrasound
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Abstract
Hirotsugu Ogi, Tomohiro Shagawa, Nobutomo Nakamura, Masahiko Hirao, Hidefumi Odaka and Naoto Kihara. Elastic-constant measurement in oxide and semiconductor thin films by Brillouin oscillations excited by picosecond ultrasound. Japanese Journal of Applied Physics, 2009, 48(7S), 07GA01. https://doi.org/10.1143/JJAP.48.07GA01.
In this study, an elastic-stiffness evaluation in transparent or translucent thin films using Brillouin oscillations detected by picosecond ultrasound is conducted. An ultrahigh-frequency (≥50 GHz) strain pulse is generated using femtosecond light pulse in specimens and propagates in the film-thickness direction. The time-delayed probe light pulse enters the specimen, which is diffracted by the strain pulse, causing oscillations in the reflectivity change of the probe light pulse. The oscillation frequency gives the elastic modulus with ellipsometry for refractive index. The theoretical calculation predicts the accuracy of stiffness measurement. The methodology is applied to the study of amorphous silica, amorphous tantalum oxide, diamond thin films, and silicon wafers.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 48 07GA01-, 2009-07-21
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1050018218947152128
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- NII Article ID
- 120007148375
- 40016664193
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- NII Book ID
- AA12295836
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- ISSN
- 13474065
- 00214922
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- HANDLE
- 11094/84162
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- NDL BIB ID
- 10289887
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- Text Lang
- en
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- Article Type
- journal article
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- Data Source
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- IRDB
- NDL
- CiNii Articles