Radiative Cooling Characteristics of Functionally Graded Silicon Suboxide Films Prepared by Magnetron Sputtering

• Goto Takashi

  Institute for Materials Research, Tohoku University

• Miyazaki Hidetoshi

  Institute for Materials Research, Tohoku University

• Masumoto Hiroshi

  Institute for Materials Research, Tohoku University

Bibliographic Information

Other Title

• マグネトロンスパッタリング法により作製した傾斜機能亜酸化けい素膜の放射冷却特性
• マグネトロンスパッタリング法により作製した傾斜機能亜酸化ケイ素膜の放射冷却特性
• マグネトロンスパッタリングホウ ニ ヨリ サクセイ シタ ケイシャ キノウ アサンカ ケイソ マク ノ ホウシャ レイキャク トクセイ

Abstract

Silicon suboxide (SiO_x) could be a potential material for radiative cooling due to appropriate infra-red absorption at wave-length (λ) between 8 and 13 μm. In this study, SiO_x films ranging from x=0.98 to 1.7 were prepared by magnetron sputtering using a SiO sintered body target. An SiO_0.98 single layer film had a relatively sharp absorption peak at λ=10 μm. The obtained SiO_0.98 film showed amorphous and a black-brown color. An optical band gap (E_g) of the SiO_0.98 film was 3.6 eV, and the SiO_x (x>1.4) film was transparent in the UV-visible range with a wide optical band gap (>4 eV). A functionally graded SiO_x layers showed broader absorption from λ=8 to 13 μm, promising for radiative cooling.

Journal

• Journal of the Japan Society of Powder and Powder Metallurgy

  Journal of the Japan Society of Powder and Powder Metallurgy 52 (11), 851-856, 2005

  Japan Society of Powder and Powder Metallurgy

Keywords

• radiative cooling
• functionally graded films
• silicon suboxide
• magnetron sputtering

Details

• CRID: 1390282681285469184
• NII Article ID: 130000056256
• NII Book ID: AN00222724
• DOI: 10.2497/jjspm.52.851
• ISSN: 18809014
• ISSN: 05328799
• NDL BIB ID: 7734220
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7734220
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed