Interactive Strength between C60 Thin Film and Si(001) and Its Influence on Nano-Scaled Tribology

• Matsumoto Naohiro

  Department of Mechanical Engineering, Graduate School of Engineering, Kobe University

• Suzuki Hiroki

  Department of Mechanical Engineering, Graduate School of Engineering, Kobe University

• Kinoshita Hiroshi

  Department of Mechanical Engineering, Graduate School of Engineering, Kobe University

• Ohmae Nobuo

  Department of Mechanical Engineering, Graduate School of Engineering, Kobe University

Abstract

The influences of interactions between C₆₀ thin films and Si substrates were investigated using atomic force microscopy (AFM). It was found that higher friction coefficient was obtained at the C₆₀ domains formed on the H-terminated Si(001) substrate and lower ones on the Si(001)-2×1 substrate. Moreover, lowest friction coefficient was found for the C₆₀ film on the Si(001)-2×1 remained after scratching. Therefore, it is thought that higher interactions between C₆₀ and Si substrate caused lower friction coefficient of C₆₀ thin film. The prepared substrate was examined by reflection high energy electron diffraction (RHEED), X-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES).

Journal

• Tribology Online

  Tribology Online 3 (4), 232-237, 2008

  Japanese Society of Tribologists

Keywords

• nanotribology
• fullerene
• AFM
• XPS
• AES
• MBE

Details

• CRID: 1390001205269485696
• NII Article ID: 130000067394
• DOI: 10.2474/trol.3.232
• ISSN: 18812198
• ISSN: 1881218X
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed