Effects of Deposition Conditions on Adhesion of DLC Films Prepared by UBM Sputtering

• NAKAMURA Morimasa

  Kyoto Institute of Technology

• MIURA Ken'ichi

  Technology Research Institute of Osaka Prefecture

• MATSUOKA Takashi

  Doshisha University

• HIRAYAMA Tomoko

  Doshisha University

• MORIWAKI Ichiro

  Kyoto Institute of Technology

Abstract

The adhesion of diamondlike carbon (DLC) films deposited on SKD11 substrates by Unbalanced Magnetron sputtering (UBMS) of a metal Cr and graphite target was investigated. DLC films, consist of Cr/C gradient interlayer and a-C:H layer, were prepared under various deposition conditions, and film-substrate adhesion was evaluated using adhesion energy equation proposed in our previous study. This equation was improved on the base of that of Bull et.al. with taking into consideration the compressive residual stress in the film. Deposition conditions (substrate bias voltage, ratio of CH₄ gas flow rate (CH₄ flow rate per total Ar and CH₄ gas), deposition temperature, deposition pressure, deposition time) were varied. From scanning electron microscope (SEM) observation of cross section of the film and analysis of electron probe micro analyzer (EPMA) for the detached area of the scratch track, it was confirmed that the films detached in the Cr/C interlayer. Adhesion energy changed characteristically and depended on the deposition conditions and corresponded to the Young's modulus of the film.

Journal

• Journal of Solid Mechanics and Materials Engineering

  Journal of Solid Mechanics and Materials Engineering 3 (5), 748-757, 2009

  The Japan Society of Mechanical Engineers

Keywords

• UBM Sputtering
• Diamondlike Carbon
• Adhesion
• Young's Modulus

Details

• CRID: 1390282680242526848
• NII Article ID: 130000127285
• DOI: 10.1299/jmmp.3.748
• ISSN: 18809871
• Web Site: http://www.jstage.jst.go.jp/article/jmmp/3/5/3_5_748/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed