Optimization of Extreme Ultraviolet Emission from Laser-Produced Tin Plasmas Based on Radiation Hydrodynamics Simulations

• SUNAHARA Atsushi

  Institute for Laser Technology, 2-6 Yamadaoka Suita Osaka 565-0871, Japan

• NISHIHARA Katsunobu

  Institute of Laser Engineering, Osaka University, 2-6 Yamadaoka Suita Osaka 565-0871, Japan

• SASAKI Akira

  Advanced Photon Research Institute of Japan Atomic Energy Agency, 8-1 Umemidai Kizugawa Kyoto 619-0215, Japan

抄録

We investigated the plasma conditions for obtaining highly efficient extreme ultraviolet light from laserproduced tin plasmas for lithography of next generation semiconductors. Based on accurate atomic data tables calculated using the detailed configuration accounting code, we conducted 1-D radiation hydrodynamic simulations to calculate the dynamics of tin plasma and its emission of extreme ultraviolet light. We included the photo-excitation effect in the radiation transport. Our simulation reproduced experimental observations successfully. Using our verified code, we found that a CO₂ laser can be useful in obtaining higher conversion efficiencies up to 4%.

収録刊行物

• Plasma and Fusion Research

  Plasma and Fusion Research 3 (0), 043-043, 2008

  一般社団法人 プラズマ・核融合学会

キーワード

• EUV
• lithography
• radiation hydrodynamics
• conversion efficiency
• laser-produced tin plasma

詳細情報

• CRID: 1390001205254972032
• NII論文ID: 130000263925
• DOI: 10.1585/pfr.3.043
• ISSN: 18806821
• Web Site: https://www.jstage.jst.go.jp/article/pfr/3/0/3_0_043/_pdf
• 本文言語コード: en
• データソース種別:
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• 抄録ライセンスフラグ: 使用不可