Formation Mechanism of Dense High-Speed Plasma Flow in Tapered Capillary Discharge

• ADACHI Koichiro

  Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan

• NAKAJIMA Mitsuo

  Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan

• KAWAMURA Tohru

  Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan

• HORIOKA Kazuhiko

  Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8502, Japan

Abstract

We propose a new type of plasma source using a pinch discharge in a tapered capillary, which generates a dense moving plasma by electromagnetic compression and acceleration. The axial velocity and flux of the moving plasma are controllable and can be maximized by adjusting the taper angle. The behavior can be illustrated with a simple model considering the pinching dynamics of the current sheet.

Journal

• Plasma and Fusion Research

  Plasma and Fusion Research 6 1201019-1201019, 2011

  The Japan Society of Plasma Science and Nuclear Fusion Research

Keywords

• moving plasma
• pulse power device
• z-pinch
• laboratory astrophysics

Details

• CRID: 1390001205255911168
• NII Article ID: 130000903692
• DOI: 10.1585/pfr.6.1201019
• ISSN: 18806821
• Web Site: http://www.jstage.jst.go.jp/article/pfr/6/0/6_0_1201019/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed