Texture development of surface-modified SiC prepared by EPD in a strong magnetic field
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- SUZUKI Tohru S.
- Materials Processing Unit, National Institute for Materials Science
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- UCHIKOSHI Tetsuo
- Materials Processing Unit, National Institute for Materials Science
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- SAKAKIBARA Saki
- Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology
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- MUTO Hiroyuki
- Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology
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- MATSUDA Atsunori
- Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology
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- SAKKA Yoshio
- Materials Processing Unit, National Institute for Materials Science
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抄録
Silicon carbide is a very important material for various applications and its properties are expected to be improved by controlling the crystallographic orientation. It was difficult to simultaneously consolidate SiC powder and sintering additives by electrophoretic deposition (EPD) because of the different electrophoretic mobility. When using the alumina-coated SiC by the sol–gel method, it is possible to deposit SiC and sintering additives by EPD at the same time.<br>In this study, we demonstrated that the c-axis alignment of SiC was controlled by EPD and a strong magnetic field, and we investigated the effect of the surface-modification on the microstructure and the degree of orientation. The dilute solution and the large number of repeated coating times prevent the oxide phase from precipitating at the multiple grain junctions and enhance grain growth. The grain growth promoted the degree of orientation in the textured SiC prepared by EPD in a strong magnetic field.
収録刊行物
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- Journal of the Ceramic Society of Japan
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Journal of the Ceramic Society of Japan 119 (1392), 667-671, 2011
公益社団法人 日本セラミックス協会
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詳細情報 詳細情報について
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- CRID
- 1390001205287437184
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- NII論文ID
- 130000971780
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- NII書誌ID
- AA12229489
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- ISSN
- 13486535
- 18820743
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- NDL書誌ID
- 11175876
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可