Modeling of Atomic Processes of Multiple Charged Ions in Plasmas and Its Application to the Study of EUV Light Sources

• SASAKI Akira

  Quantum Beam Science Directorate, Japan Atomic Energy Agency, Kizugawa 619-0215, Japan

• NISHIHARA Katsunobu

  Institute of Laser Engineering, Osaka University, Suita 565-0871, Japan

• SUNAHARA Atsushi

  Institute for Laser Technology, Osaka 550-0004, Japan

• FURUKAWA Hiroyuki

  Institute for Laser Technology, Osaka 550-0004, Japan

• NISHIKAWA Takeshi

  Department of Electrical and Electronic Engineering, Okayama University, Okayama 700-8530, Japan

• KOIKE Fumihiro

  Physics Laboratory, School of Medicine, Kitasato University, Sagamihara 228-8555, Japan

抄録

Atomic processes of multiple-charged ions of high-Z elements from tin to dysprosium are investigated for their application to light sources for extreme-ultra-violet (EUV) lithography. Modeling of these ions in plasmas, including tungsten, which is being considered for use as a divertor and wall material in the fusion devices, is discussed. Atomic spectra become very complex in the case of low-charged ions below Pd-like ions, which calls for a new atomic code for calculating the energy levels and rate coefficients of collisional and radiative processes. The collisional radiative model is validated through code comparison workshop activities. An alternative method for investigating the formation of the non-uniform structure of the plasmas is also presented.

収録刊行物

• Plasma and Fusion Research

  Plasma and Fusion Research 6 2401145-2401145, 2011

  一般社団法人 プラズマ・核融合学会

キーワード

• atomic process
• radiative transfer
• EUV
• lithography

詳細情報

• CRID: 1390001205253357568
• NII論文ID: 130002059523
• DOI: 10.1585/pfr.6.2401145
• ISSN: 18806821
• Web Site: http://www.jstage.jst.go.jp/article/pfr/6/0/6_0_2401145/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
  • KAKEN
• 抄録ライセンスフラグ: 使用不可