Fabrication of Ni-W Electroformed Mold for Thermal Imprint of Borosilicate Glass

• YASUI Manabu

  Kanagawa Industrial Technology Center

• KANEKO Satoru

• TAKAHASHI Masaharu

• ITO Hiroaki

• ARAI Masahiro

• HIRABAYASHI Yasuo

• OZAWA Takeshi

• MAEDA Ryutaro

Bibliographic Information

Other Title

• 硼珪酸ガラスを対象とした熱インプリント用Ni-W電鋳金型の作製

Abstract

We proposed an electroformed mold for thermal imprint of borosilicate glass in this paper. The mold was made of Ni-W electrodeposition film that was superior to heat-resistance and removing glass. The resist pattern for electroforming was fabricated with SU8-10. Ni-W solution for electroforming was developed by mixing nickel sulfamate, tungsten sodium and citric acid. The minimum pitch and the height of the pattern on Ni-W electroformed mold were about 40 μm and 3.8 μm, respectively. The thermal imprint for borosilicate glass carried out with Ni-W electroformed mold. The shape of the Ni-W electroformed mold was printed on the borosilicate glass by thermal imprint. The borosilicate glass was removed from the Ni-W electroformed mold easily.

Journal

• TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A

  TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series A 79 (800), 507-511, 2013

  The Japan Society of Mechanical Engineers

Keywords

• Ni-W
• Electroforming
• Mold
• Thermal Imprinting
• Borosilicate Glass

Details

• CRID: 1390001204479184000
• NII Article ID: 130003374624
• DOI: 10.1299/kikaia.79.507
• ISSN: 18848338
• ISSN: 03875008
• Web Site: https://www.jstage.jst.go.jp/article/kikaia/79/800/79_507/_pdf
• Text Lang: ja
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed