高温環境下におけるSiN<sub><font size="-1">x</font></sub>/SiC<sub><font size="-1">y</font></sub>ナノ積層薄膜の自己き裂治癒挙動  [in Japanese] Self-Crack-Healing Behavior of SiN<sub><font size="-1">x</font></sub>/SiC<sub><font size="-1">y</font></sub> Nano-Laminated Thin Film under High Temperature Environment  [in Japanese]

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Abstract

A self-crack-healing behavior of SiN<sub><font size="-1">x</font></sub>/SiC<sub><font size="-1">y</font></sub> nano-laminated thin film under high temperature environment was investigated. The films were fabricated on silicon substrate by an ion beam assisted deposition. The thickness of the SiN<sub><font size="-1">x</font></sub>/SiC<sub><font size="-1">y</font></sub> nano-laminated film was 1μm and four layered film was deposited. To compare with the crack healing behavior of laminated film, SiN<sub><font size="-1">x</font></sub> and SiC<sub><font size="-1">y</font></sub> monolayer films were also fabricated. After the deposition, the pre-cracked samples were heated using an electric furnace in an air atmosphere at the temperature of 600°C to 1200°C. In the case of SiN<sub><font size="-1">x</font></sub> and SiC<sub><font size="-1">y</font></sub> monolayer films, the crack was poorly healed after heating at the temperature lower than 800°C. This was because the size of a crack opening increased after heating due to the release of residual stress. On the other hand, slight crack healing occurred for 24h at the temperature of 600°C. It was confirmed that Auger electron count for oxygen atom was high along the healed crack, indicating that the crack healing was achieved by oxidation reaction on crack plane. Crack healing improved with an increase in the heating temperature and time. Moreover, the crack healing finished for 72 and 24h at 600 and 800°C, respectively. From these results, we concluded that SiN<sub><font size="-1">x</font></sub>/SiC<sub><font size="-1">y</font></sub> nano-laminated film has a superior self-crack-healing ability. However, the heating over 1200°C caused oxidation of film overall and disappeared the laminate structure. From these results, it is suggested that an upper limitation of heating temperature exists for self-crack-healing of SiN<sub><font size="-1">x</font></sub>/SiC<sub><font size="-1">y</font></sub> nano-laminated thin film.

Journal

  • Journal of the Society of Materials Science, Japan

    Journal of the Society of Materials Science, Japan 62(10), 634-639, 2013

    The Society of Materials Science, Japan

Codes

  • NII Article ID (NAID)
    130003384095
  • NII NACSIS-CAT ID (NCID)
    AN00096175
  • Text Lang
    JPN
  • ISSN
    0514-5163
  • NDL Article ID
    024945144
  • NDL Call No.
    Z14-267
  • Data Source
    NDL  J-STAGE 
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