書誌事項
- タイトル別名
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- Self-align Fabrication of Narrow-gapped Dual AFM Tip using Si Trench Refilling with SOG and Magneto-strictive Film Stacked Dual Cantilever Formation
- Si トレンチ ノ SOG ウメコミ ニ ヨル キンセツ デュアル AFMタンシン ト ジワイマク セキソウ デュアルカンチレバー ノ サクセイ
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抄録
This paper reports on a novel self-align fabrication process of narrow-gapped dual AFM (Atomic force microscopy) tip. The dual AFM tip was fabricated on (100) orientated Si substrate by using narrow trench etching, trench refilling with SOG (spin-on-glass), CMP (chemical-mechanical-polishing), and Si crystalline anisotropic etching. Through the process, a sharp dual AFM tip with a gap of 500 nm, which was defined by only the etched trench, width was successfully fabricated. Although other fabrication process using an acrylic-nitrile-styrene-epoxy resin refilling was also attempted, dual tip was not obtained due to the poor adhesion of the resin in silicon etching process. In addition, a dual AFM cantilever (Magneto-storictive film/Si 2.0 µm) was formed by MEMS fabrication process. The fabricated FePd 0.4 µm/Si 2.0 µm and Ni 1.3 µm/Si 2.0 µm cantilever were individually deflected to 1.4 µm at 300 Gauss and 0.4 µm at 240 Gauss due to effects of magnetic flux and negative-magneto-striction, respectively.
収録刊行物
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- 電気学会論文誌E(センサ・マイクロマシン部門誌)
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電気学会論文誌E(センサ・マイクロマシン部門誌) 134 (4), 90-95, 2014
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390001204462081408
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- NII論文ID
- 130003391595
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL書誌ID
- 025466924
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可