Preparation and Properties of (NiZn)Fe<SUB>2</SUB>O<SUB>4</SUB> Film by RF Reactive Sputtering
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- Chen Qing
- Faculty of Engineering Science, Osaka University
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- Tsujimoto Hiroaki
- Faculty of Engineering Science, Osaka University
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- Shirae Kimisuke
- Faculty of Engineering Science, Osaka University
抄録
A reactive rf-sputtering method is used for depositing polycrystalline (NiZn)Fe2O4 films. The relations between the magnetic properties of the ferrite films and the sputtering conditions are examined in detail. The best condition of rf-sputtering, under which the magnetization of the films as well as the bulks is obtained and the initial relative permeabilities amount to 50∼100 even in the frequency region over the Snoek's limit, is found. Finally, the way to improve the preparation of the films is discussed.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 28 (10), 1825-1828, 1989
公益社団法人 応用物理学会
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詳細情報
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- CRID
- 1570572703147162112
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- NII論文ID
- 130003468534
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- ISSN
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- CiNii Articles