Growth, Quantum Confinement and Transport Mechanisms of Ge Nanodot Arrays Formed on a SiO2 Monolayer

  • Nakayama Yasuo
    Center for Frontier Science, Chiba University, Japan
  • Matsuda Iwao
    The Institute for Solid State Physics (ISSP), The University of Tokyo, Japan Core Research for Evolutional Science and Technology (CREST), Japan Science and Technology Agency (JST), Japan
  • Hasegawa Shuji
    Department of Physics, Graduate School of Science, The University of Tokyo, Japan Core Research for Evolutional Science and Technology (CREST), Japan Science and Technology Agency (JST), Japan
  • Ichikawa Masakazu
    Quantum-Phase Electronics Center, Department of Applied Physics, Graduate School of Engineering, The University of Tokyo, Japan Core Research for Evolutional Science and Technology (CREST), Japan Science and Technology Agency (JST), Japan

Abstract

In this review, recent findings on growth manners, quantum confinement phenomena, and carrier transport mechanisms of self-assembled Ge nanodots on an oxidized Si surface are summarized. A simple equation relating the dot size, which was estimated by STM images, with the Ge coverage was proposed. Quantum confinement was observed by photoemission spectroscopy (PES) and scanning tunneling spectroscopy (STS), and the actual height of the confining potential was determined from the dot-size vs. energy relationship through a three dimensional parabolic potential model. The transport mechanism of the nanodot arrays, which was estimated based on the measurements by a microscopic four-point-probe method, was distinct depending on the structure of the dot-substrate interface. All results suggest that the interface oxide layer and subnanometer-sized voids on it interconnecting the nanodots with the substrate not only regulate the quantized energy in the nanodots but also switch on/off carrier exchange between the nanodot and the substrate through variable interface potential barrier height. [DOI: 10.1380/ejssnt.2008.191]

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