Phase-Field Simulation of Self-Assembled Quantum Dots

DOI

抄録

A phase-field model for self-assembled quantum dot formation has been developed in which the surface morphologies are determined to be dependent on the balance between the surface energy and the elastic strain energy caused by the lattice mismatch strain. The facet morphologies, which are often observed in semiconductor materials, have also been modeled using the generalized gradient correction coefficient for a crystal with a high anisotropy of surface energy. The variations of surface morphologies and energies have been examined by performing two-dimensional phase-field simulations for the annealing process of heteroepitaxial film. By taking sixteen-fold anisotropy into consideration, the multifaceted islands, which change shape with film thickness, can be created. The differences in morphological change and energy variations due to the mode number of the surface energy anisotropy have also been evaluated.

収録刊行物

  • Theoretical and Applied Mechanics Japan

    Theoretical and Applied Mechanics Japan 54 (0), 341-347, 2005

    日本学術会議 「機械工学委員会・土木工学・建築学委員会合同IUTAM分科会」

詳細情報 詳細情報について

  • CRID
    1390282680186121984
  • NII論文ID
    130004463582
  • DOI
    10.11345/nctam.54.341
  • ISSN
    13494244
    13480693
  • 本文言語コード
    en
  • データソース種別
    • JaLC
    • CiNii Articles
  • 抄録ライセンスフラグ
    使用不可

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