Interaction Force Analysis of Resist Film Surface in Water Vapor

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  • Niiyama Takayoshi
    Department of Electrical Engineering, Nagaoka University of Technology
  • Kawai Akira
    Department of Electrical Engineering, Nagaoka University of Technology

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In various humidity conditions, the interaction behavior between a resist film surface and an atomic force microscope (AFM) tip is characterized. The attractive and repulsive force due to Lenard-Jones potential can be detected clearly. In the dry condition (less than 4%RH), maximum attractive force becomes relatively small and the interactive distance becomes short. On the other hand, in the water vapor condition (70%RH), the maximum attractive force and the interactive distance become large and long, respectively. In order to analyze the interaction mechanism, Derjaguin approximation formula is employed for the AFM tip-resist system. In the attractive region, Hamaker constants in each environmental condition can be estimated. Hamaker constant in vapor condition becomes large as compared with that in dry condition. The AFM enables precise analysis for attractive interaction of resist patterns in nano-scale. It is fair certain to discuss that the micro defect such as resist fragment is attracted to the resist pattern in vapor condition.

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