Meniscus Analysis in Micro Gap during Liquid Drying Process

• Ishikawa Atsushi

  Department of Electrical Engineering, Nagaoka University of Technology

• Sakata Makoto

  Department of Electrical Engineering, Nagaoka University of Technology

• Kawai Akira

  Department of Electrical Engineering, Nagaoka University of Technology

抄録

The drying process of the rinse water affects strongly to pattern collapse phenomena during development process. In order to analyze the water meniscus behavior, a PET film is used as a parallel line pattern. By using this transparent pattern, wetting behavior of water meniscus between two patterns can be observed. In the drying process of water meniscus, it is clearly observed that the meniscus enters from the side edge of the parallel pattern. The meniscus behavior can be analyzed based on capillary rise and gravity.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 17 (3), 457-460, 2004

  フォトポリマー学会

キーワード

• resist pattern
• rinse water
• Laplace force
• meniscus
• pattern collapse
• adhesion
• gravity

詳細情報

• CRID: 1390001204323699072
• NII論文ID: 130004464373
• NII論文ID: 40006276574
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.17.457
• COI: 1:CAS:528:DC%2BD2cXmtlGgsLk%3D
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 6981381
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I6981381
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer/17/3/17_3_457/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• 抄録ライセンスフラグ: 使用不可