Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres

  • Shoji Atsumu
    Bio-Nano Electronics Research Center, Faculty of Engineering, Toyo University
  • Fukushima Taketoshi
    Department of Applied Chemistry, Faculty of Engineering, Toyo University
  • Kumar D. Sadthi
    Bio-Nano Electronics Research Center, Faculty of Engineering, Toyo University
  • Kashiwagi Kunihiro
    Department of Applied Chemistry, Faculty of Engineering, Toyo University
  • Yoshida Yasuhiko
    Bio-Nano Electronics Research Center, Faculty of Engineering, Toyo University

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抄録

Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluated during our work. By introducing O2 gas and HCOOH vapor, we found that the plasma polymer films were showing high hydrophilic and antifogging nature. The films produced in the ambience of CF4 gas and the carbon fluoride gases found to be high hydrophobic in nature but were not showed any antifogging property.

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