Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres
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- Shoji Atsumu
- Bio-Nano Electronics Research Center, Faculty of Engineering, Toyo University
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- Fukushima Taketoshi
- Department of Applied Chemistry, Faculty of Engineering, Toyo University
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- Kumar D. Sadthi
- Bio-Nano Electronics Research Center, Faculty of Engineering, Toyo University
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- Kashiwagi Kunihiro
- Department of Applied Chemistry, Faculty of Engineering, Toyo University
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- Yoshida Yasuhiko
- Bio-Nano Electronics Research Center, Faculty of Engineering, Toyo University
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抄録
Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluated during our work. By introducing O2 gas and HCOOH vapor, we found that the plasma polymer films were showing high hydrophilic and antifogging nature. The films produced in the ambience of CF4 gas and the carbon fluoride gases found to be high hydrophobic in nature but were not showed any antifogging property.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 19 (2), 241-244, 2006
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詳細情報 詳細情報について
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- CRID
- 1390001204326407040
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- NII論文ID
- 130004464489
- 40007307336
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 7955862
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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