Numerical Study on Fabrication Tolerance of Half-Ridge InP Polarization Converters

• ZAITSU Masaru

  The University of Tokyo

• TANEMURA Takuo

  The University of Tokyo

• NAKANO Yoshiaki

  The University of Tokyo

Abstract

Integrated InP polarization converters based on half-ridge structure are studied numerically. We demonstrate that the fabrication tolerance of the half-ridge structure can be extended significantly by introducing a slope at the ridge side and optimizing the thickness of the residual InGaAsP layer. High polarization conversion over 90 % is achieved with the broad range of the waveguide width from 705 to 915 nm, corresponding to a factor-of-two or larger improvement in the fabrication tolerance compared with that of the conventional polarization converters. Finally we present a simple fabrication procedure of this newly proposed structure, where the thickness of the residual InGaAsP layer is controlled precisely by using a thin etch-stop layer.

Journal

• IEICE Transactions on Electronics

  IEICE Transactions on Electronics E97.C (7), 731-735, 2014

  The Institute of Electronics, Information and Communication Engineers

Keywords

• Polarization converters
• fabrication tolerances
• monolithic integration
• polarization-multiplexing
• photonic integrated circuits

Details

• CRID: 1390282679355134464
• NII Article ID: 130004519144
• DOI: 10.1587/transele.e97.c.731
• ISSN: 17451353
• ISSN: 09168524
• Web Site: https://www.jstage.jst.go.jp/article/transele/E97.C/7/E97.C_731/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed