Experimental Study of Very-High-Frequency Plasmas in H2 by Spatiotemporally Resolved Optical Emission Spectroscopy.

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Author(s)

    • Kakuta Shigeru
    • Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Yokohama 223
    • Kitajima Takeshi
    • Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Yokohama 223
    • Okabe Yutaka
    • Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Yokohama 223
    • Makabe Toshiaki
    • Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Yokohama 223

Abstract

A very-high-frequency (VHF) plasma at 100 MHz is experimentally investigated in parallel-plate configuration in H<SUB>2</SUB> using spatiotemporal optical emission spectroscopy and current-voltage-power waveforms. The observed optical emission intensity and net excitation rate profiles have strong temporal and spatial variations. The VHF plasma is still capacitive, and is maintained by reflected electrons in the oscillating sheath next to the instantaneous cathode. The characteristics of VHF plasmas, that the excitation rate increases in proportion to the square of driving frequency, and that the minimum sustaining voltage and pressure decrease with increasing frequency, are experimentally confirmed at pressures, ranging from 0.01 to 2 Torr and at the frequency of 100 MHz .

Journal

  • Japanese Journal of Applied Physics

    Japanese Journal of Applied Physics 33(7B), 4335-4339, 1994

    The Japan Society of Applied Physics

Codes

  • NII Article ID (NAID)
    130004520393
  • Text Lang
    ENG
  • ISSN
    0021-4922
  • Data Source
    J-STAGE 
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