Atomic-Resolution Imaging of ZnSSe(110) Surface with Ultrahigh-Vacuum Atomic Force Microscope(UHV-AFM).
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- Sugawara Yasuhiro
- Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
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- Ohta Masahiro
- Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
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- Ueyama Hitoshi
- Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
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- Morita Seizo
- Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
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抄録
Atomic-resolution imaging of a ZnSSe(110) surface grown by molecular beam epitaxy on a GaAs substrate was demonstrated for the first time with an ultrahigh-vacuum atomic force microscope (UHV-AFM). A rectangular lattice with spacing of 5.6± 0.6 Å and 4.0± 0.4 Å is resolved. This result suggests that the UHV-AFM has potential to image the group II-VI compound semiconductor surfaces having dangling bonds, on an atomic scale.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 34 (4A), L462-L464, 1995
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390282681223287296
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- NII論文ID
- 110003922797
- 210000038685
- 130004521238
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- NII書誌ID
- AA10650595
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- COI
- 1:CAS:528:DyaK2MXltFaht7s%3D
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- ISSN
- 13474065
- 00214922
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可