Atomic-Resolution Imaging of ZnSSe(110) Surface with Ultrahigh-Vacuum Atomic Force Microscope(UHV-AFM).

  • Sugawara Yasuhiro
    Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
  • Ohta Masahiro
    Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
  • Ueyama Hitoshi
    Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan
  • Morita Seizo
    Department of Physics, Faculty of Science, Hiroshima University, Higashi–Hiroshima, Hiroshima 724, Japan

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Atomic-resolution imaging of a ZnSSe(110) surface grown by molecular beam epitaxy on a GaAs substrate was demonstrated for the first time with an ultrahigh-vacuum atomic force microscope (UHV-AFM). A rectangular lattice with spacing of 5.6± 0.6 Å and 4.0± 0.4 Å is resolved. This result suggests that the UHV-AFM has potential to image the group II-VI compound semiconductor surfaces having dangling bonds, on an atomic scale.

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