Force Imaging of Optical Near-Field Using Noncontact Mode Atomic Force Microscopy.

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  • Abe Masayuki
    Department of Electronic Engineering, Osaka University, 2–1 Yamada–oka, Suita, Osaka 565, Japan
  • Sugawara Yasuhiro
    Department of Electronic Engineering, Osaka University, 2–1 Yamada–oka, Suita, Osaka 565, Japan
  • Hara Yasuyuki
    Department of Electronic Engineering, Osaka University, 2–1 Yamada–oka, Suita, Osaka 565, Japan
  • Sawada Kazuyoshi
    Department of Electronic Engineering, Osaka University, 2–1 Yamada–oka, Suita, Osaka 565, Japan
  • Morita Seizo
    Department of Electronic Engineering, Osaka University, 2–1 Yamada–oka, Suita, Osaka 565, Japan

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  • Force Imaging of Optical Near-Field Usi

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We demonstrate a novel method to detect the van der Waals force gradient and the force gradient induced by the optical evanescent field on the surface, simultaneously, with high resolution. We use the noncontact mode atomic force microscopy (NC-AFM) with frequency modulation (FM) detection method, which can detect the force gradient with high sensitivity in a vacuum. The force gradient due to the evanescent field can be enhanced by applying the bias voltage. The 100-nm-diameter polystyrene latex spheres are observed with spatial resolution better than 50 nm (λ/14).

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