Temporal Saturation Effects of Nanoscale Contact Holes Fabricated by Chemical Shrink Techniques

• Li Tsung-Lung

  Department of Applied Physics, National Chia-Yi University

• Ting Jyh-Hua

  National Nano Device Laboratories

抄録

The temporal saturation effects of the critical dimensions of nanoscale contact holes are investigated by a two-dimensional reaction–diffusion simulator for the chemical shrink techniques of nanolithography. Models included with the simulator are the crosslinking reaction of water-soluble polymers and crosslinkers, the diffusion of photoacids, and the inactivation of photoacids. Within the the statistical errors of the experimental data, the simulation critical dimensions agree with the experiment for baking temperatures over 105°C and for all baking times. It is found that the temporal saturation of the contact holes’ critical dimensions can be explained by the photoacid inactivating reaction included in the simulator.

収録刊行物

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 44 (8), 6327-6331, 2005

  The Japan Society of Applied Physics

キーワード

• chemical shrink technique
• RELACS process
• nanolithography
• reaction–diffusion simulation
• temporal saturation effects

詳細情報

• CRID: 1390282681241849600
• NII論文ID: 40006818325
• NII論文ID: 130004534583
• NII論文ID: 210000058669
• NII書誌ID: AA10457675
• DOI: 10.1143/jjap.44.6327
• ISSN: 13474065
• ISSN: 00214922
• NDL書誌ID: 7402886
• Web Site: http://id.ndl.go.jp/bib/7402886
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7402886
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.6327
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.6327/pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
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