Fabrication and Electrical Properties of (Bi,La)4Ti3O12 Thin Films Deposited with Electric-Field-Assisted Annealing

• Nakayama Hiroshi

  Fuji Industrial Research Institute of Shizuoka Prefecture Department of Materials Science, Shizuoka University

• Sugiyama Osamu

  Fuji Industrial Research Institute of Shizuoka Prefecture

• Mano Tsuyoshi

  Fuji Industrial Research Institute of Shizuoka Prefecture

• Shibuya Yoshio

  Fuji Industrial Research Institute of Shizuoka Prefecture

• Hoshi Yusuke

  Department of Materials Science, Shizuoka University

• Suzuki Hisao

  Department of Materials Science, Shizuoka University

Bibliographic Information

Other Title

• Fabrication and Electrical Properties of (Bi,La)₄Ti₃O₁₂ Thin Films Deposited with Electric-Field-Assisted Annealing

Abstract

Bi_3.35La_0.75Ti₃O₁₂ (BLT) thin films were deposited with electric-field-assisted annealing (EFA-A) by chemical solution deposition (CSD) to increase the degree of the preferred orientation. The X-ray diffraction intensities of (200)/(020) planes in the BLT films were increased by EFA-A, compared with those in the BLT film annealed without EFA-A. The remanent polarization (P_r) for the film deposited with EFA-A exhibited a higher value than that for the film deposited without EFA-A. The P_r value for the BLT film deposited without EFA-A was 21 μC/cm². On the other hand, the P_r value for the BLT film deposited with EFA-A was as high as 28 μC/cm². The enhancement of the polarization in the film deposited with EFA-A was ascribed to the increase in the number of grains in the film oriented in the direction of the polarized axis. In addition, the pyroelectric and piezoelectric properties of the resulting films were measured to investigate the effect of the EFA-A. The pyroelectric coefficient and the effective d₃₃ value of the films were also improved by EFA-A. The tendencies of the pyroelectric and piezoelectric properties of the BLT films were in good agreement with the P–E hysteresis loops of the films.

Journal

• Japanese Journal of Applied Physics

  Japanese Journal of Applied Physics 44 (9B), 6947-6951, 2005

  The Japan Society of Applied Physics

Keywords

• ferroelectrics
• BLT film
• CSD
• electric-field-assisted annealing
• preferred orientation
• pyroelectric property
• piezoelectric property

Details

• CRID: 1390001206268572672
• NII Article ID: 210000058812
• NII Article ID: 130004534720
• NII Article ID: 40006898861
• NII Book ID: AA10457675
• DOI: 10.1143/jjap.44.6947
• ISSN: 13474065
• ISSN: 00214922
• NDL BIB ID: 7460308
• Web Site: http://id.ndl.go.jp/bib/7460308
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I7460308
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.6947
• Web Site: https://iopscience.iop.org/article/10.1143/JJAP.44.6947/pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed