Development and applications of an automatic modeling system of deposition profile calculations for microfabrication
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- Takahashi Takahiro
- Faculty of Engineering, Shizuoka University
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- Arakawa Masamoto
- School of Engineering, The University of Tokyo
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- Funatsu Kimito
- School of Engineering, The University of Tokyo
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- Ema Yoshinori
- Faculty of Engineering, Shizuoka University
Bibliographic Information
- Other Title
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- 超微細加工を対象とした成膜形状計算の自動モデリングシステムの開発と応用
Abstract
Chemical Vapor Deposition (CVD) is one of the most important ultra fine manufacturing processes for semiconductor devices. Although simulators are very helpful for developing CVD processes, large calculation costs of the simulators obstruct extensive utilization of them. We showed that modeling of correlations between calculating conditions and calculated results by the simulators radically decreases the calculation costs of them. Therefore, we developed software agent for automatic modeling of calculation processes of the simulators. The agent makes input data for the simulators, and takes output data by operating the simulators. It also makes training data from both the input and output data, and calculates the models of the calculation processes of the simulators by operating general-purpose modeling software. We applied the agent to the simulators for CVD deposition profiles on the substrates with micrometer-sized trenches. The agent successfully made the good training data, and proposed good models of the calculation processes by use of neural networks.
Journal
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- Proceedings of the Symposium on Chemoinformatics
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Proceedings of the Symposium on Chemoinformatics 2004 (0), JP31-JP31, 2004
Division of Chemical Information and Computer Sciences The Chemical Society of Japan
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Details 詳細情報について
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- CRID
- 1390001205736414464
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- NII Article ID
- 130004574829
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- Data Source
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- JaLC
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed