Nano-finishing Using a Micro-particle Controlled by Optical Radiation Force
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- Hida Kenshirou
- Osaka University
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- Miyoshi Takashi
- Osaka University
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- Takaya Yasuhiro
- Osaka University
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- Hayashi Terutake
- Osaka University
Bibliographic Information
- Other Title
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- 光放射圧を利用した微粒子制御によるナノ仕上加工に関する研究
- 加工特性の解析
Abstract
A novel nano–finishing technique using a micro–particle controlled by optical radiation force has been proposed as the new high–precision processing technique especially focusing on finishing. In this paper, in order to verify the availability of the proposed technique to local nano–polishing, polishing experiments to the rough silicon surface with Rq of several dozen nanometers have been conducted. The experimental results show that the surface roughness with spatial wavelength of 10–6 to 10–8m of the several square micrometers local area can be reduced.
Journal
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- Proceedings of JSPE Semestrial Meeting
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Proceedings of JSPE Semestrial Meeting 2005A (0), 943-944, 2005
The Japan Society for Precision Engineering
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Details 詳細情報について
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- CRID
- 1390282680625267712
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- NII Article ID
- 130004657252
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- Data Source
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- JaLC
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed