Measurement of crystallization temperature of Pd-based amorphous alloy thin film by energy dispersive X-ray reflectometry
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- Yamamoto Tokujiro
- Institute for Materials Research, Tohoku University
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- Hayashi Kouichi
- Institute for Materials Research, Tohoku University
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- Suzuki Kosuke
- Graduate student, Department of Engineering, Gunma University
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- Ito Masahisa
- Department of Engineering, Gunma University
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- Kimura Hisamichi
- Institute for Materials Research, Tohoku University
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- Inoue Akihisa
- Tohoku University
Abstract
X-ray reflectivity of a Pd-based amorphous alloy thin film was measured by an energy dispersive method in the vicinity of crystallization temperature upon heating. A large number of oscillations of X-ray reflectivity were clearly observed, because the surface of the amorphous alloy thin film is extraordinary smooth. The oscillations of X-ray reflection became smaller after crystallization of the film, as the surface roughness of the film is increased by grain boundaries. Thickness of the film estimated from the distance between the peaks of the oscillations was decreased when the film was heated to higher temperature than 140 ℃. It is considered that the crystallization temperature of the Pd-based amorphous alloy thin film is about 140 ℃.
Journal
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- Transactions of the Materials Research Society of Japan
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Transactions of the Materials Research Society of Japan 34 (4), 627-629, 2009
The Materials Research Society of Japan
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Details 詳細情報について
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- CRID
- 1390282680490158208
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- NII Article ID
- 130004676266
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- COI
- 1:CAS:528:DC%2BC3cXisFKit7g%3D
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- ISSN
- 21881650
- 13823469
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- Text Lang
- en
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed