Perpendicularly Oriented SiO<sub>2</sub> Nanopillar Array on SiO<sub>2</sub> Adhesive Layer

  • Yamashita Nanae
    Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology
  • Komiyama Hideaki
    Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology
  • Zhao Yongbin
    Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology
  • Komura Motonori
    Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology
  • Iyoda Tomokazu
    Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology
  • Nagai Keiji
    Division of Integrated Molecular Engineering, Chemical Resources Laboratory, Tokyo Institute of Technology

抄録

Silica (SiO2) nanopillar array was fabricated using microphase-separated block copolymer (PEOm-b-PMA(Az)n) thin film as a nano-template. Sol-gel precursor was selectively introduced into perpendicularly oriented poly(ethylene oxide) (PEO) nanocylindrical microdomains on a SiO2 sol derived adhesive layer/Si wafer. The PEO cylindrical microdomains could give perpendicular orientation to the SiO2 adhesive layer. The SiO2 adhesive layer would support controlling the perpendicular orientation of SiO2 nanopillar array due to increasing attachment area and forming Si-O-Si networks between SiO2 nanopillar array and the SiO2 adhesive layer during calcination process.

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