Spatial Point Analysis of Ion Track Patterns using Common Polymer Films by Atomic Forced Microscopy

• Omichi Masaaki

  Department of Applied Chemistry, Graduate School of Engineering, Osaka University Center for Collaborative Research, Anan National College of Technology

• Choi Wookjin

  Department of Applied Chemistry, Graduate School of Engineering, Osaka University

• Tsukuda Satoshi

  Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

• Sugimoto Masaki

  Japan Atomic Energy Agency, Takasaki Advanced Radiation Research Institute

• Seki Shu

  Department of Applied Chemistry, Graduate School of Engineering, Osaka University

Abstract

In the all fluence, the observed cumulative probabilities agree mostly with the theoretical cumulative probability. Random patterns, again, are reproducible to the distribution of ion tracks, and the charged ion particle rarely interferes with another charged ion particles at low fluence. This is the first report that nearest neighbor method was also applied to track pattern. This analysis will be contributed to not only fundamental study but also applied study such as cancer therapy.

Journal

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 27 (5), 561-564, 2014

  The Society of Photopolymer Science and Technology(SPST)

Keywords

• Spatial point analysis
• Nearest neighbor method
• Charged particle
• Ion track

Details

• CRID: 1390282679302427520
• NII Article ID: 130004691084
• NII Article ID: 40020132877
• NII Book ID: AA11576862
• DOI: 10.2494/photopolymer.27.561
• ISSN: 13496336
• ISSN: 09149244
• NDL BIB ID: 025603948
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025603948
• Web Site: https://www.jstage.jst.go.jp/article/photopolymer/27/5/27_561/_pdf
• Text Lang: en
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed